Semiconductor devices are electronic components that exploit the electronic properties of semiconductor material, principally silicon, germanium, and gallium arsenide, as well as organic semiconductors. Semiconductor devices have replaced thermionic devices (vacuum tubes) in most applications. They use electronic conduction in the solid state as opposed to the gaseous state or thermionic emission in a high vacuum.
Semiconductor devices are manufactured both as single discrete devices and as integrated circuits (ICs), which consist of a number – from a few (as low as two) to billions – of devices manufactured and interconnected on a single semiconductor substrate, or wafer.
Semiconductor materials are useful because their behavior can be easily manipulated by the addition of impurities, known as doping. Semiconductor conductivity can be controlled by the introduction of an electric or magnetic field, by exposure to light or heat, or by the mechanical deformation of a doped monocrystalline grid; thus, semiconductors can make excellent sensors. Current conduction in a semiconductor occurs via mobile or "free" electrons and holes, collectively known as charge carriers. Doping a semiconductor such as silicon with a small proportion of an atomic impurity, such as phosphorus or boron, greatly increases the number of free electrons or holes within the semiconductor. When a doped semiconductor contains excess holes it is called "p-type", and when it contains excess free electrons it is known as "n-type", where p (positive for holes) or n (negative for electrons) is the sign of the charge of the majority mobile charge carriers. The semiconductor material used in devices is doped under highly controlled conditions in a fabrication facility, or fab, to control precisely the location and concentration of p- and n-type dopants. The junctions which form where n-type and p-type semiconductors join together are called p–n junctions.
Semiconductor devices made per year have been growing by 9.1% on average since 1978, and shipments in 2018 are predicted for the first time to exceed 1 trillion,[1] meaning that well over 7 trillion has been made to date, in just in the decade prior.
Semiconductor devices are manufactured both as single discrete devices and as integrated circuits (ICs), which consist of a number – from a few (as low as two) to billions – of devices manufactured and interconnected on a single semiconductor substrate, or wafer.
Semiconductor materials are useful because their behavior can be easily manipulated by the addition of impurities, known as doping. Semiconductor conductivity can be controlled by the introduction of an electric or magnetic field, by exposure to light or heat, or by the mechanical deformation of a doped monocrystalline grid; thus, semiconductors can make excellent sensors. Current conduction in a semiconductor occurs via mobile or "free" electrons and holes, collectively known as charge carriers. Doping a semiconductor such as silicon with a small proportion of an atomic impurity, such as phosphorus or boron, greatly increases the number of free electrons or holes within the semiconductor. When a doped semiconductor contains excess holes it is called "p-type", and when it contains excess free electrons it is known as "n-type", where p (positive for holes) or n (negative for electrons) is the sign of the charge of the majority mobile charge carriers. The semiconductor material used in devices is doped under highly controlled conditions in a fabrication facility, or fab, to control precisely the location and concentration of p- and n-type dopants. The junctions which form where n-type and p-type semiconductors join together are called p–n junctions.
Semiconductor devices made per year have been growing by 9.1% on average since 1978, and shipments in 2018 are predicted for the first time to exceed 1 trillion,[1] meaning that well over 7 trillion has been made to date, in just in the decade prior.
Diode
A
semiconductor diode is a device typically made from a single p–n
junction. At the junction of a p-type and an n-type semiconductor there
forms a depletion region where current conduction is inhibited by the lack of mobile charge carriers. When the device is forward biased (connected with the p-side at higher electric potential
than the n-side), this depletion region is diminished, allowing for
significant conduction, while only very small current can be achieved
when the diode is reverse biased and thus the depletion region expanded.
Exposing a semiconductor to light can generate electron–hole pairs,
which increases the number of free carriers and thereby the
conductivity. Diodes optimized to take advantage of this phenomenon are
known as photodiodes.
Compound semiconductor diodes can also be used to generate light, as in light-emitting diodes and laser diodes.
Transistor
Bipolar junction transistor
Bipolar junction transistors are formed from two p–n junctions, in either n–p–n or p–n–p configuration. The middle, or base, region between the junctions is typically very narrow. The other regions, and their associated terminals, are known as the emitter and the collector.
A small current injected through the junction between the base and the
emitter changes the properties of the base-collector junction so that it
can conduct current even though it is reverse biased. This creates a
much larger current between the collector and emitter, controlled by the
base-emitter current.
Field-effect transistor
Another type of transistor, the field-effect transistor, operates on the principle that semiconductor conductivity can be increased or decreased by the presence of an electric field.
An electric field can increase the number of free electrons and holes
in a semiconductor, thereby changing its conductivity. The field may be
applied by a reverse-biased p–n junction, forming a junction field-effect transistor (JFET) or by an electrode insulated from the bulk material by an oxide layer, forming a metal–oxide–semiconductor field-effect transistor (MOSFET).
The MOSFET, a solid-state device, is the most used semiconductor device today. The gate electrode is charged to produce an electric field that controls the conductivity of a "channel" between two terminals, called the source and drain. Depending on the type of carrier in the channel, the device may be an n-channel (for electrons) or a p-channel (for holes) MOSFET. Although the MOSFET is named in part for its "metal" gate, in modern devices polysilicon is typically used instead.
Semiconductor device materials
By far, silicon
(Si) is the most widely used material in semiconductor devices. Its
combination of low raw material cost, relatively simple processing, and a
useful temperature range makes it currently the best compromise among
the various competing materials. Silicon used in semiconductor device
manufacturing is currently fabricated into boules that are large enough in diameter to allow the production of 300 mm (12 in.) wafers.
Germanium
(Ge) was a widely used early semiconductor material but its thermal
sensitivity makes it less useful than silicon. Today, germanium is often
alloyed with silicon for use in very-high-speed SiGe devices; IBM is a major producer of such devices.
Gallium arsenide
(GaAs) is also widely used in high-speed devices but so far, it has
been difficult to form large-diameter boules of this material, limiting
the wafer diameter to sizes significantly smaller than silicon wafers
thus making mass production of GaAs devices significantly more expensive
than silicon.
Other less common materials are also in use or under investigation.
Silicon carbide (SiC) has found some application as the raw material for blue light-emitting diodes (LEDs) and is being investigated for use in semiconductor devices that could withstand very high operating temperatures and environments with the presence of significant levels of ionizing radiation. IMPATT diodes have also been fabricated from SiC.
Various indium compounds (indium arsenide, indium antimonide, and indium phosphide) are also being used in LEDs and solid state laser diodes. Selenium sulfide is being studied in the manufacture of photovoltaic solar cells.
The most common use for organic semiconductors is organic light-emitting diodes.
List of common semiconductor devices
Two-terminal devices:
- DIAC
- Diode (rectifier diode)
- Gunn diode
- IMPATT diode
- Laser diode
- Light-emitting diode (LED)
- Photocell
- Phototransistor
- PIN diode
- Schottky diode
- Solar cell
- Transient-voltage-suppression diode
- Tunnel diode
- VCSEL
- Zener diode
Three-terminal devices:
- Bipolar transistor
- Darlington transistor
- Field-effect transistor
- Insulated-gate bipolar transistor (IGBT)
- Silicon-controlled rectifier
- Thyristor
- TRIAC
- Unijunction transistor
Four-terminal devices:
- Hall effect sensor (magnetic field sensor)
- Photocoupler (Optocoupler)
Semiconductor device applications
All transistor types can be used as the building blocks of logic gates, which are fundamental in the design of digital circuits. In digital circuits like microprocessors, transistors act as on-off switches; in the MOSFET, for instance, the voltage applied to the gate determines whether the switch is on or off.
Transistors used for analog circuits
do not act as on-off switches; rather, they respond to a continuous
range of inputs with a continuous range of outputs. Common analog
circuits include amplifiers and oscillators.
Circuits that interface or translate between digital circuits and analog circuits are known as mixed-signal circuits.
Power semiconductor devices
are discrete devices or integrated circuits intended for high current
or high voltage applications. Power integrated circuits combine IC
technology with power semiconductor technology, these are sometimes
referred to as "smart" power devices. Several companies specialize in
manufacturing power semiconductors.
Component identifiers
The type designators
of semiconductor devices are often manufacturer specific. Nevertheless,
there have been attempts at creating standards for type codes, and a
subset of devices follow those. For discrete devices, for example, there are three standards: JEDEC JESD370B in United States, Pro Electron in Europe and Japanese Industrial Standards (JIS) in Japan.
History of semiconductor device development
Cat's-whisker detector
Semiconductors had been used in the electronics field for some time
before the invention of the transistor. Around the turn of the 20th
century they were quite common as detectors in radios, used in a device called a "cat's whisker" developed by Jagadish Chandra Bose
and others. These detectors were somewhat troublesome, however,
requiring the operator to move a small tungsten filament (the whisker)
around the surface of a galena (lead sulfide) or carborundum (silicon carbide) crystal until it suddenly started working.
Then, over a period of a few hours or days, the cat's whisker would
slowly stop working and the process would have to be repeated. At the
time their operation was completely mysterious. After the introduction
of the more reliable and amplified vacuum tube
based radios, the cat's whisker systems quickly disappeared. The "cat's
whisker" is a primitive example of a special type of diode still
popular today, called a Schottky diode.
Metal rectifier
Another early type of semiconductor device is the metal rectifier in which the semiconductor is copper oxide or selenium. Westinghouse Electric (1886) was a major manufacturer of these rectifiers.
World War II
During World War II, radar research quickly pushed radar receivers to operate at ever higher frequencies and the traditional tube based radio receivers no longer worked well. The introduction of the cavity magnetron from Britain to the United States in 1940 during the Tizard Mission resulted in a pressing need for a practical high-frequency amplifier.
On a whim, Russell Ohl of Bell Laboratories decided to try a cat's whisker.
By this point they had not been in use for a number of years, and no
one at the labs had one. After hunting one down at a used radio store in
Manhattan, he found that it worked much better than tube-based systems.
Ohl investigated why the cat's whisker functioned so well. He
spent most of 1939 trying to grow more pure versions of the crystals. He
soon found that with higher quality crystals their finicky behaviour
went away, but so did their ability to operate as a radio detector. One
day he found one of his purest crystals nevertheless worked well, and it
had a clearly visible crack near the middle. However as he moved about
the room trying to test it, the detector would mysteriously work, and
then stop again. After some study he found that the behaviour was
controlled by the light in the room – more light caused more conductance
in the crystal. He invited several other people to see this crystal,
and Walter Brattain immediately realized there was some sort of junction at the crack.
Further research cleared up the remaining mystery. The crystal
had cracked because either side contained very slightly different
amounts of the impurities Ohl could not remove – about 0.2%. One side of
the crystal had impurities that added extra electrons (the carriers of
electric current) and made it a "conductor". The other had impurities
that wanted to bind to these electrons, making it (what he called) an
"insulator". Because the two parts of the crystal were in contact with
each other, the electrons could be pushed out of the conductive side
which had extra electrons (soon to be known as the emitter) and
replaced by new ones being provided (from a battery, for instance) where
they would flow into the insulating portion and be collected by the
whisker filament (named the collector). However, when the voltage
was reversed the electrons being pushed into the collector would
quickly fill up the "holes" (the electron-needy impurities), and
conduction would stop almost instantly. This junction of the two
crystals (or parts of one crystal) created a solid-state diode, and the
concept soon became known as semiconduction. The mechanism of action
when the diode is off has to do with the separation of charge carriers around the junction. This is called a "depletion region".
Development of the diode
Armed with the knowledge of how these new diodes worked, a vigorous effort began to learn how to build them on demand. Teams at Purdue University, Bell Labs, MIT, and the University of Chicago
all joined forces to build better crystals. Within a year germanium
production had been perfected to the point where military-grade diodes
were being used in most radar sets.
Development of the transistor
After the war, William Shockley decided to attempt the building of a triode-like semiconductor device. He secured funding and lab space, and went to work on the problem with Brattain and John Bardeen.
The key to the development of the transistor was the further understanding of the process of the electron mobility
in a semiconductor. It was realized that if there were some way to
control the flow of the electrons from the emitter to the collector of
this newly discovered diode, an amplifier could be built. For instance,
if contacts are placed on both sides of a single type of crystal,
current will not flow between them through the crystal. However if a
third contact could then "inject" electrons or holes into the material,
current would flow.
Actually doing this appeared to be very difficult. If the crystal
were of any reasonable size, the number of electrons (or holes)
required to be injected would have to be very large, making it less than
useful as an amplifier
because it would require a large injection current to start with. That
said, the whole idea of the crystal diode was that the crystal itself
could provide the electrons over a very small distance, the depletion
region. The key appeared to be to place the input and output contacts
very close together on the surface of the crystal on either side of this
region.
Brattain started working on building such a device, and
tantalizing hints of amplification continued to appear as the team
worked on the problem. Sometimes the system would work but then stop
working unexpectedly. In one instance a non-working system started
working when placed in water. Ohl and Brattain eventually developed a
new branch of quantum mechanics, which became known as surface physics,
to account for the behavior. The electrons in any one piece of the
crystal would migrate about due to nearby charges. Electrons in the
emitters, or the "holes" in the collectors, would cluster at the surface
of the crystal where they could find their opposite charge "floating
around" in the air (or water). Yet they could be pushed away from the
surface with the application of a small amount of charge from any other
location on the crystal. Instead of needing a large supply of injected
electrons, a very small number in the right place on the crystal would
accomplish the same thing.
Their understanding solved the problem of needing a very small
control area to some degree. Instead of needing two separate
semiconductors connected by a common, but tiny, region, a single larger
surface would serve. The electron-emitting and collecting leads would
both be placed very close together on the top, with the control lead
placed on the base of the crystal. When current flowed through this
"base" lead, the electrons or holes would be pushed out, across the
block of semiconductor, and collect on the far surface. As long as the
emitter and collector were very close together, this should allow enough
electrons or holes between them to allow conduction to start.
The first transistor
The Bell team made many attempts to build such a system with various
tools, but generally failed. Setups where the contacts were close enough
were invariably as fragile as the original cat's whisker detectors had
been, and would work briefly, if at all. Eventually they had a practical
breakthrough. A piece of gold foil was glued to the edge of a plastic
wedge, and then the foil was sliced with a razor at the tip of the
triangle. The result was two very closely spaced contacts of gold. When
the wedge was pushed down onto the surface of a crystal and voltage
applied to the other side (on the base of the crystal), current started
to flow from one contact to the other as the base voltage pushed the
electrons away from the base towards the other side near the contacts.
The point-contact transistor had been invented.
While the device was constructed a week earlier, Brattain's notes
describe the first demonstration to higher-ups at Bell Labs on the
afternoon of 23 December 1947, often given as the birthdate of the
transistor. What is now known as the "p–n–p point-contact germanium transistor" operated as a speech amplifier with a power gain of 18 in that trial. John Bardeen, Walter Houser Brattain, and William Bradford Shockley were awarded the 1956 Nobel Prize in physics for their work.
Origin of the term "transistor"
Bell
Telephone Laboratories needed a generic name for their new invention:
"Semiconductor Triode", "Solid Triode", "Surface States Triode" [sic], "Crystal Triode" and "Iotatron" were all considered, but "transistor", coined by John R. Pierce,
won an internal ballot. The rationale for the name is described in the
following extract from the company's Technical Memoranda (May 28, 1948)
calling for votes:
Transistor. This is an abbreviated combination of the words "transconductance" or "transfer", and "varistor". The device logically belongs in the varistor family, and has the transconductance or transfer impedance of a device having gain, so that this combination is descriptive.
Improvements in transistor design
Shockley
was upset about the device being credited to Brattain and Bardeen, who
he felt had built it "behind his back" to take the glory. Matters became
worse when Bell Labs lawyers found that some of Shockley's own writings
on the transistor were close enough to those of an earlier 1925 patent
by Julius Edgar Lilienfeld that they thought it best that his name be left off the patent application.
Shockley was incensed, and decided to demonstrate who was the real brains of the operation.
A few months later he invented an entirely new, considerably more
robust, type of transistor with a layer or 'sandwich' structure. This
structure went on to be used for the vast majority of all transistors
into the 1960s, and evolved into the bipolar junction transistor.
With the fragility problems solved, a remaining problem was purity. Making germanium
of the required purity was proving to be a serious problem, and limited
the yield of transistors that actually worked from a given batch of
material. Germanium's sensitivity to temperature also limited its
usefulness. Scientists theorized that silicon would be easier to
fabricate, but few investigated this possibility. Gordon K. Teal was the first to develop a working silicon transistor, and his company, the nascent Texas Instruments,
profited from its technological edge. From the late 1960s most
transistors were silicon-based. Within a few years transistor-based
products, most notably easily portable radios, were appearing on the
market.
The static induction transistor, the first high frequency transistor, was invented by Japanese engineers Jun-ichi Nishizawa and Y. Watanabe in 1950. It was the fastest transistor through to the 1980s.
A major improvement in manufacturing yield came when a chemist advised the companies fabricating semiconductors to use distilled rather than tap water: calcium ions present in tap water were the cause of the poor yields. "Zone melting", a technique using a band of molten material moving through the crystal, further increased crystal purity.